CD-SEM for photomasks "Z Series"
CD-SEM for photomasks capable of high-speed and high-precision measurement of nano-patterns.
The "Z Series" is a CD-SEM developed for photomasks aimed at sub-10 nm advanced devices, further evolving the unique high-resolution technology and charge mitigation technology cultivated over many years in the photomask market. It supports various samples such as EUV masks, NIL Qz molds, PET film molds, and DSA films. Please feel free to contact us if you have any requests. 【Features】 ■ Further improved aberration correction technology for obtaining high SNR images ■ Charge-free SEM images obtained through low vacuum technology, enabling high-precision measurements ■ Diverse applications (multi-point measurement, contour extraction, 2D measurement, defect review, 3D display) *For more details, please download the PDF or contact us.
- Company：ホロン
- Price：Other
